Partial pressure control of the reactive gas for high-rate reactive sputtering
Works with multiple partial pressure feedback signals - mass spectrometer, cathode voltage,
optical emission, and lambda sensor System-wide approach to reactive sputtering
Patented technology in conjunction with RSI’s 30+ years of experience in reactive sputtering
Fast and flexible microprocessor-driven closed-loop control of the reactive gas
Active real-time monitoring and feedback of the process conditions in order to make online
adjustments in the process
System-specific, specially designed gas delivery system
RSI designed multi-level (nested) loops to control the reactive process
Multi-target capability
Multi-gas capability featuring:
Installs on virtually any machine (retrofit, OEM, end user)
Two modes of interface/operation:
OEM integrated into the host system software with communication occurring via
RS232, ethernet, and/or input-output signals
Stand-alone operation: IRESS can be controlled via the supplied User Interface
(installed on any Windows® PC) and used as a stand-alone device with no
modification to the host system software (great for the research environment)
Hysteresis curve generation to aid the user in identifying and repeating deposition conditions
Proprietary calibration routines to ensure process repeatability
Data logging of process parameters