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Courses Available Tribological Coatings
Course Description: This course is intended for design engineers, materials scientists, and coatings developers who have a need to specify and develop coatings for tribological applications (i.e., those in which wear must be reduced or prevented and/or friction minimized). The coatings also may need to have corrosion-resistant properties to operate in arduous conditions. The course begins with a description of the mechanics of wear and discusses the problems of selecting coatings for optimal tribological performance. An overview of the main processes for producing tribological coatings is given, emphasizing vacuum deposition methods. Tribological test methods also are over-viewed, including tests for adhesion and mechanical properties. Coatings developed for enhanced tribological properties are described, and information is provided on some applications for these coatings. Course Outline: Wear mechanisms and theories (adhesion, abrasion, erosion, fatigue, corrosion, etc.) Tribological and mechanical test methods (e.g., pin on disc, abrasive wheel, scratch
adhesion, microhardness, etc.) Coating processes and selection Benefits of ceramic coatings by PVD methods Information on tribological coatings (e.g., metal nitrides, carbides, oxides, superlattices,
multilayers, nanocomposites, DLC, etc., plus hybrid and duplex processes) Applications information (e.g., metal cutting and forming, molding, bearings, pumps, auto
parts, etc.)
Sputter Deposition
Course Description: Sputtering is used to deposit films for a wide variety of applications including optical, electronic, magnetic, tribological, solar cell, decorative, and architectural. In this course, you will come to understand how the sputtering process works and how the process parameters greatly affect the structure and properties of the deposited films. The course provides an understanding of the cause and effect of changes in sputtering parameters on the energetics of the sputtering and deposition processes and their relationship to film properties. The energy and distribution of species ejected from the target are discussed. The effect of the sputtering system on material transport to the substrate and subsequent film deposition is also discussed for films of metals, alloys, and compounds. The parameters of different sputtering systems (diode, triode, magnetron, and ion guns) with DC and RF power supplies are discussed with respect to film properties. The basics of reactive sputtering are presented to give the student an appreciation of the process, and finally the newly developing field of high power pulsed magnetron sputtering is discussed to show the potential power of this new technique. Course Outline: The basic sputtering process – how ions eject atoms from the target surface The similarities and differences between magnetron, diode, triode, and ion beam systems The different types of power used for sputtering and for biasing of substrates The effects of process parameters on the structure and properties of the deposited films The basics of reactive sputtering High power pulsed magnetron sputtering
Reactive Sputter Deposition
Course Description: Reactive sputtering is used to deposit coatings for many applications including tooling, architectural glass, tribological, electronic, optical, solar cell, decorative, functional and many others. In this course, you will come to understand the reactive sputtering process. The advantages of partial pressure control of the reactive gas vs. flow control will be discussed. It will be shown that partial pressure control allows operation in the transition region between the metallic state of the sputtering target and the so-called poisoned state providing both high deposition rates and good film properties. Partial pressure control of the reactive gas requires that a reactive gas sensor be used, and the advantages and disadvantages of the different partial pressure sensors will be reviewed. Reactive sputtering of insulating films requires the detection and or suppression of arcing during the process. Power supplies are available today that can prevent arcing, and the similarities and differences of the different arc suppression power supplies will be discussed. Large area coating is an important application for reactive sputtering, but distribution of the reactive gas within the chamber must be carefully controlled with multiple gas inlet zones to prevent partial or complete poisoning of the sputtering target. New applications for reactive sputtering include multiple gas reactive sputtering and high power pulse reactive magnetron sputtering. How these new applications can be applied and the benefits of them will be presented. Course Outline: - The basics of reactive sputtering
- Flow-partial pressure relationships and hysteresis effects
- Reactive sputtering models
- Mass flow vs. partial pressure control
- Reactive gas sensors and power supplies for reactive sputtering
- Large area reactive sputtering
- Multiple gas reactive sputtering
- Reactive high power pulse magnetron sputtering
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